(2021.05) Kim TK et al. Journal of Hazardous Materials. Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

Home (2021.05) Kim TK et al. Journal of Hazardous Materials. Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

(2021.05) Kim TK et al. Journal of Hazardous Materials. Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

저자

Kim TK et al.

저널 정보

Journal of Hazardous Materials

출간연도

2021.05

링크

학술지명	Journal of Hazardous Materials
교신저자	조경덕
공동저자	Tae-Kyoung Kim, Taeyeon Kim, Inae Lee, Kyungho Choi, Kyung-Duk Zoh
논문구분	SCI
논문번호	Volume 409, 123759
게재년월	2021. 05

서울대학교 보건대학원 환경독성학연구실Environmental Toxicology Laboratory

(2021.05) Kim TK et al. Journal of Hazardous Materials. Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

(2021.05) Kim TK et al. Journal of Hazardous Materials. Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

서울대학교 보건대학원 환경독성학연구실